Nanofabrication using a stencil mask

Abstract

A technique for fabricating metal structures approximately 15-20 nm wide using a stencil mask is developed. Structure can be made by evaporating metal at multiple fixed angles, or they can be drawn continuously by tilting the stencil and thus scanning the substrate relative to the stencil orifice. The technique is useful for performing lithography on substrates for which it is not possible to apply resist.