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Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation

Applied Physics Letters (2005) 86(7) 1-3
DOI: 10.1063/1.1868075
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Abstract

We demonstrate UV poling of a pure fused silica sample by applying to it an electric field of 200 kV/cm and irradiating it with high-intensity (∼40 GW cm2) femtosecond (220 fs) laser pulses at 264 nm. © 2005 American Institute of Physics.

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Corbari, C., Kazansky, P. G., Slattery, S. A., & Nikogosyan, D. N. (2005). Ultraviolet poling of pure fused silica by high-intensity femtosecond radiation. Applied Physics Letters, 86(7), 1–3. https://doi.org/10.1063/1.1868075

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