Atom beam sputtered Mo 2 C films as a diffusion barrier for copper metallization

Abstract

The saddle field fast atom beam sputtered (ABS) 50 nm thick molybdenum carbide (Mo 2 C) films as a diffusion barrier for copper metallization were investigated. To study the diffusion barrier properties of Mo 2 C films, the as-deposited and annealed samples were characterized using four probes, X-ray diffraction, field enhanced scanning electron microscopy, energy dispersive X-ray analysis, atomic force microscopy and Rutherford back scattering techniques. The amorphous structure of the barrier films along with presence of carbon atoms at the molybdenum carbide-silicon interface is understood to reduce effective grain boundaries and responsible for increased thermal stability of Cu/Mo 2 C/Si structure. The lowest resistivity of the as-deposited molybdenum carbide barrier films was ∼29 μΩ cm. The low carbon containing molybdenum carbide was found thermally stable up to 700 °C, therefore can potentially be used as a diffusion barrier for copper metallization. © 2008 Elsevier B.V. All rights reserved.