Study on daylighting optimization in the exhibition halls of museums for Chinese calligraphy and painting works

Abstract

With respect to the light environment of the exhibition halls for Chinese calligraphy and painting works in the museums, the daylighting design in these display spaces have been studied, the key design factors, such as daylighting pattern, and arrangement of exhibits are examined and explored by field trips. Then, the display spaces are divided into diverse categories whose sky light environments are predicted by the demands of exhibits. Under changed daylighting situations, the daylight parameters, i.e., daylight factor (DF) and DF uniformity, discomfort glare index (DGI) and luminance distribution are calculated. Thus, the proper daylighting pattern and elements in the exhibition halls will be decided. The optimization strategies that optimize the parameters of daylighting patterns and elements are presented. The studies have shown that the daylighting quality will improved by the implement of optimal design, and good luminance environment in the calligraphy and painting exhibition halls are obtained.