Double-sided mesoporous silicon formation for thermal insulating applications

Abstract

A double-sided porous silicon (PS) formation technique that produces bulk meso-PS structures throughout the thickness of a monocrystalline Si wafer is presented. Bulk meso-PS prepared by this method can have a homogeneous morphology. Overall, this method presents a new opportunity to fabricate in a simple and reliable way thick PS membranes for thermal insulation applications by selective PS etching from one side of the double-sided structure.