Plasma resistances of yttria deposited by EB-PVD method

Abstract

Plasma resistant nanocrystalline Y2O3 films were deposited on alumina substrates through the electron-beam PVD technique. Increasing substrate temperature to 600°C resulted in the textured microstructures with significantly enhanced adhesion force of the coating to the substrate. During the exposure to fluorine plasma, erosion rate of the coated specimen was higher than that of a sintered yttria specimen, but significantly lower than that of a single crystalline alumina. Considering the adhesion and erosion behaviors observed in the coated specimen prepared at 600°C, the deposition technique appears effective in reducing contamination particles generated from the ceramic parts in the plasma environment.