Lateral β-Ga2O3 field effect transistors

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Abstract

Beta phase Gallium Oxide (BGO) is an emerging ultra-wide bandgap semiconductor with disruptive potential for ultra-low power loss, high-efficiency power applications. The critical field strength is the key enabling material parameter of BGO which allows sub-micrometer lateral transistor geometry. This property combined with ion-implantation technology and large area native substrates result in exceptionally low conduction power losses, faster power switching frequency and even radio frequency power. We present a review of BGO epitaxial materials and lateral field-effect transistors developments, highlight early achievements and discuss engineering solutions with power switching and radio frequency applications in mind.

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Chabak, K. D., Leedy, K. D., Green, A. J., Mou, S., Neal, A. T., Asel, T., … Jessen, G. H. (2020). Lateral β-Ga2O3 field effect transistors. Semiconductor Science and Technology. Institute of Physics Publishing. https://doi.org/10.1088/1361-6641/ab55fe

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