Surface and grain boundary segregation in Fe-3%Si alloy

Abstract

The surface segregation on the Fe-3wt.%Si alloy was studied using X-ray Photoelectron Spectroscopy (XPS) with synchrotron radiation at 150 eV photon beam energy (Si 2p). A silicon oxide layer and also segregation of Si atoms in three clearly resolved phases occurred during heat treatment. A formation of suicides mainly with the Fe3Si superstructure was observed. A silicon nitride layer was created by nitrogen ion implantation. The structure and atomic ordering in a surface layer of the samples (approx. 300 nm thick) was checked by Conversion Electron Mössbauer Spectroscopy (CEMS). Simultaneously emission Mössbauer spectroscopy was used for the investigation of the Si concentration and atomic ordering at grain boundaries.