Abstract
The time-of-flight technique has been used to measure the drift velocities for electrons and holes in high-purity single-crystalline CVD diamond. Measurements were made in the temperature interval 83 T 460 K and for electric fields between 90 and 4 10 3 V/cm, applied in the 100 crystallographic direction. The study includes low-field drift mobilities and is performed in the low-injection regime to perturb the applied electric field only minimally. © 2011 American Institute of Physics.
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CITATION STYLE
Gabrysch, M., Majdi, S., Twitchen, D. J., & Isberg, J. (2011). Electron and hole drift velocity in chemical vapor deposition diamond. Journal of Applied Physics, 109(6). https://doi.org/10.1063/1.3554721
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