Multiphoton lithography: Principles, materials and applications

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Abstract

Multiphoton Lithography is a technique that allows the fabrication of three-dimensional structures with sub-100 nm resolution. It is based on multi-photon absorption; when the beam of an ultra-fast laser is tightly focused into the volume of a transparent, photosensitive material, polymerization can be initiated by non-linear absorption within the focal volume. By moving the laser focus three-dimensionally through the material, 3D structures can be fabricated. The technique has been implemented with a variety of materials and several components and devices have been fabricated such as photonic crystals (Fig. 1a), biomedical devices (Fig. 1b), and microscopic models (Fig. 1c).

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Farsari, M. (2016). Multiphoton lithography: Principles, materials and applications. In 2016 Conference on Lasers and Electro-Optics, CLEO 2016. Institute of Electrical and Electronics Engineers Inc. https://doi.org/10.1364/cleo_si.2016.sw4l.1

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