Abstract
Multiphoton Lithography is a technique that allows the fabrication of three-dimensional structures with sub-100 nm resolution. It is based on multi-photon absorption; when the beam of an ultra-fast laser is tightly focused into the volume of a transparent, photosensitive material, polymerization can be initiated by non-linear absorption within the focal volume. By moving the laser focus three-dimensionally through the material, 3D structures can be fabricated. The technique has been implemented with a variety of materials and several components and devices have been fabricated such as photonic crystals (Fig. 1a), biomedical devices (Fig. 1b), and microscopic models (Fig. 1c).
Cite
CITATION STYLE
Farsari, M. (2016). Multiphoton lithography: Principles, materials and applications. In 2016 Conference on Lasers and Electro-Optics, CLEO 2016. Institute of Electrical and Electronics Engineers Inc. https://doi.org/10.1364/cleo_si.2016.sw4l.1
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